DIFFUSION OF GOLD IN DISLOCATION-FREE OR HIGHLY DISLOCATED SILICON MEASURED BY THE SPREADING-RESISTANCE TECHNIQUE

被引：111

作者：

STOLWIJK, NA

HOLZL, J

FRANK, W

WEBER, ER

MEHRER, H

机构：

[1] MAX PLANCK INST MET RES,INST PHYS,D-7000 STUTTGART 80,FED REP GER

[2] UNIV COLOGNE,INST PHYS 2,MET PHYS ABT,D-5000 COLOGNE 41,FED REP GER

[3] UNIV STUTTGART,INST THEORET & ANGEW PHYS,D-7000 STUTTGART 80,FED REP GER

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1986年 / 39卷 / 01期

关键词：

D O I：

10.1007/BF01177162

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：37 / 48

页数：12

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