DIELECTRIC PROPERTIES OF ANODIC OXIDES FORMED ON SPUTTERED TA-AL ALLOY-FILMS

被引：7

作者：

LUBY, S ^{[1
]}

机构：

[1] SLOVAK ACAD SCI, INST ELECT ENGN, BRATISLAVA, CZECHOSLOVAKIA

来源：

THIN SOLID FILMS | 1976年 / 32卷 / 01期

关键词：

D O I：

10.1016/0040-6090(76)90556-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：61 / 64

页数：4

共 14 条

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[4]

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[5] ELECTRON-MICROPROBE COMPOSITIONAL ANALYSIS OF SPUTTERED TANTALUM-ALUMINUM FILMS [J].

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SCHILDER, J .

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[6] ANODIC OXIDES OF TA-AL ALLOY FILMS [J].

MUTH, DG ;

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[8] COSPUTTERED ALUMINUM-RICH ALTA ALLOY FILMS [J].

SCHAUER, A ;

ROSCHY, M .

IEEE TRANSACTIONS ON PARTS HYBRIDS AND PACKAGING, 1973, PHP9 (04) :230-233

[9] CORRELATION BETWEEN TEMPERATURE COEFFICIENT OF CAPACITANCE AND DIELECTRIC LOSS IN TANTALUM AND TANTALUM-ALUMINUM ANODIC OXIDES [J].

SCHOEN, JM ;

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JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1972, 119 (09) :1215-+

[10] CONTROLLED PREPARATION OF ALLOYS BY SIMULTANEOUS, MULTITARGET SPUTTERING [J].

SEGATTO, PR .

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