ION-SURFACE INTERACTIONS DURING THIN-FILM DEPOSITION

被引：175

作者：

TAKAGI, T

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1984年 / 2卷 / 02期

关键词：

D O I：

10.1116/1.572748

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：382 / 388

页数：7

共 30 条

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[18]

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[20] EVALUATION OF METAL AND SEMICONDUCTOR-FILMS FORMED BY IONIZED-CLUSTER BEAM DEPOSITION [J].

TAKAGI, T ;

YAMADA, I ;

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THIN SOLID FILMS, 1976, 39 (DEC) :207-217

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