HOLE TRAPPING IN OXIDES GROWN BY RAPID THERMAL-PROCESSING

被引：7

作者：

SEAGER, CH

SCHUBERT, WK

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1988年 / 63卷 / 08期

关键词：

D O I：

10.1063/1.341172

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2869 / 2871

页数：3

共 25 条

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