学术探索
学术期刊
新闻热点
数据分析
智能评审

The SCattering with angular limitation in projection electron-beam lithography (SCALPEL) system

被引：19
作者：
Liddle, JA
Berger, SD
Biddick, CJ
Blakey, MI
Bolan, KJ
Bowler, SW
Brady, K
Camarda, RM
Connelly, WF
Crorken, A
Custy, J
Farrow, RC
Felker, JA
Fetter, LA
Freeman, B
Harriott, LR
Hopkins, L
Huggins, HA
Knurek, CS
Kraus, JS
Mixon, DA
Mkrtchyan, MM
Novembre, AE
Peabody, ML
Simpson, WM
Tarascon, RG
Wade, HH
Waskiewicz, WK
Watson, GP
Williams, JK
Windt, DL
机构：
[1] AT and T Bell Laboratories, Murray Hill, NJ, 07974
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1995年 / 34卷 / 12B期
关键词：
electron-beam; lithography; projection; microfabrication;
D O I：
10.1143/JJAP.34.6663
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
A SCALPEL(R) (S Cattering with Angular Limitation in Projection Electron-beam Lithography) proof-of-concept lithography system, comprising a tool, a reticle and a resist, has been designed to address the critical issues that must be investigated to determine if this approach is viable as a practical lithographic technology.
引用
收藏
页码：6663 / 6671
页数：9
相关论文
共 34 条
  • [1] 1-4 DEMAGNIFYING ELECTRON PROJECTION SYSTEM
    ASAI, T
    ITO, S
    ETO, T
    MIGITAKA, M
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1980, 19 : 47 - 50
  • [2] NEW APPROACH TO PROJECTION-ELECTRON LITHOGRAPHY WITH DEMONSTRATED 0.1 MU-M LINEWIDTH
    BERGER, SD
    GIBSON, JM
    [J]. APPLIED PHYSICS LETTERS, 1990, 57 (02) : 153 - 155
  • [3] PARTICLE-PARTICLE INTERACTION EFFECTS IN IMAGE PROJECTION LITHOGRAPHY SYSTEMS
    BERGER, SD
    EAGLESHAM, DJ
    FARROW, RC
    FREEMAN, RR
    KRAUS, JS
    LIDDLE, JA
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06): : 2294 - 2298
  • [4] BERGER SD, 1994, SPIE PHOTOMASK TECHN, V2322, P434
  • [5] BOHLEN H, 1984, SOLID STATE TECHNOL, V27, P210
  • [6] BROERS AN, 1971, 11TH P S EL ION LAS
  • [7] CHARACTERIZATION OF SILICON OPEN STENCIL MASKS IN AN ION PROJECTION LITHOGRAPHY MACHINE
    BUCHMANN, LM
    MESCHEDER, U
    TORKLER, M
    [J]. MICROELECTRONIC ENGINEERING, 1991, 13 (1-4) : 353 - 356
  • [8] STEP-AND-SCAN LITHOGRAPHY USING REDUCTION OPTICS
    BUCKLEY, JD
    GALBURT, DN
    KARATZAS, C
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (06): : 1607 - 1612
  • [9] MARKS FOR ALIGNMENT AND REGISTRATION IN PROJECTION ELECTRON LITHOGRAPHY
    FARROW, RC
    LIDDLE, JA
    BERGER, SD
    HUGGINS, HA
    KRAUS, JS
    CAMARDA, RM
    TARASCON, RG
    JURGENSEN, CW
    KOLA, RR
    FETTER, L
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06): : 2175 - 2178
  • [10] MARK DETECTION FOR ALIGNMENT AND REGISTRATION IN A HIGH-THROUGHPUT PROJECTION ELECTRON LITHOGRAPHY TOOL
    FARROW, RC
    LIDDLE, JA
    BERGER, SD
    HUGGINS, HA
    KRAUS, JS
    CAMARDA, RM
    JURGENSEN, CW
    KOLA, RR
    FETTER, L
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (06): : 2780 - 2783
1234