ANALYSIS AND OPTIMAL-DESIGN OF SEMI-INSULATOR PASSIVATED HIGH-VOLTAGE FIELD PLATE STRUCTURES AND COMPARISON WITH DIELECTRIC PASSIVATED STRUCTURES

The influences of the field oxide thickness and the junction depth on the breakdown voltage of semi-insulator passivated planar junctions with the field plate are investigated using a 2D simulator. This is done by analyzing the two extreme situations: the planar junction with an infinitely long field plate, and the deep-depleted MOS structure having a finite size. This rather unconventional approach has offered a new physical insight into the role of the metal field plate and has revealed that the severe field crowding associated with a shallow planar junction can be greatly suppressed by using a thin field oxide. The breakdown voltage and the optimal field oxide thickness of the semi-insulator passivated field plate structures remain nearly constant over a wide variation in the junction depth, and therefore such structures are attractive for realizing high-voltages in vertical devices fabricated by the low-voltage IC technology. The influences of the field plate width and the inter-electrode spacing are studied by the conventional approach, and a simple and widely applicable design guideline is given for both the nonpunchthrough and the punchthrough type structures. The influence of the surface charge in the range 0 to 10(12) cm-2 is found to be negligible. The semi-insulator passivated and the dielectric passivated field plate structures are compared under optimal conditions. This suggests that the semi-insulator passivated structures are attractive when thin field oxide and a shallow planar junction are needed and that the dielectric passivated structures are better when compactness is desired.