CHARACTERIZATION OF INP/GAAS EPILAYERS GROWN ON SI SUBSTRATES BY LOW-PRESSURE ORGANOMETALLIC VAPOR-PHASE EPITAXY

被引:11
作者
LEE, MK
WUU, DS
TUNG, HH
YU, KY
HUANG, KC
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D O I
10.1063/1.99260
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O59 [应用物理学];
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页码:880 / 882
页数:3
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