GROWTH OF ZNS AND ZNSSE BY GAS-SOURCE MOLECULAR-BEAM EPITAXY USING HYDRIDE GROUP-VI SOURCES

被引:4
作者
IMAIZUMI, M
ENDOH, Y
SUITA, M
OHTSUKA, KI
ISU, T
NUNOSHITA, M
机构
[1] Semiconductor Research Laboratory, Mitsubishi Electric Corporation, Amagasaki, Hyogo, 661
关键词
D O I
10.1016/0022-0248(95)80032-8
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
ZnS and ZnSSe layers were successfully grown by gas-source molecular beam epitaxy using hydride H2S and H2Se sources, and their surface morphology was very smooth. The full width at half maximum of X-ray rocking curve of the ZnSxSe1-x layer with S composition x of 0.06 (lattice-matching to a GaAs substrate) was as low as 22 are sec. For the ZnSSe layer, the electron concentration was controlled in a 10(17) cm(-3) range by using n-type dopant gallium, and a net acceptor concentration of 7.3 x 10(17) cm(-3) was obtained by using active-nitrogen as p-type dopant. Using n- and p-ZnSSe layers, separate-confinement-heterostructure multiple-quantum-well laser diodes were fabricated. Lasing operation was observed by injecting a pulsed current at 77 K.
引用
收藏
页码:707 / 711
页数:5
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