MODELING ION-BEAM MILLING

被引：15

作者：

YOUNGNER, DW

HAYNES, CM

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1982年 / 21卷 / 02期

关键词：

Compendex;

D O I：

10.1116/1.571812

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Integrated circuit manufacture

引用

页码：677 / 680

页数：4

共 12 条

[1] HIGH-EFFICIENCY BLAZED GRATING COUPLERS [J].

AOYAGI, T ;

AOYAGI, Y ;

NAMBA, S .

APPLIED PHYSICS LETTERS, 1976, 29 (05) :303-304

[2] CONSIDERATIONS ON HIGH-RESOLUTION PATTERNS ENGRAVED BY ION ETCHING [J].

CANTAGREL, M .

IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) :483-486

[3]

JEWETT R, 1979, UCBERLM7968 U CAL EL

[4] MICROFABRICATION BY ION-BEAM ETCHING [J].

LEE, RE .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02) :164-170

[5] REDEPOSITION - SERIOUS PROBLEM IN RF SPUTTER ETCHING OF STRUCTURES WITH MICRONMETER DIMENSIONS [J].

LEHMANN, HW ;

KRAUSBAUER, L ;

WIDMER, R .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01) :281-284

[6] ION ETCHING FOR PATTERN DELINEATION [J].

MELLIARSMITH, CM .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (05) :1008-1022

[7]

NEUREUTHER AR, 1980, J VAC SCI TECHNOL, V16, P1767

[8] SIMULATION OF DRY ETCHED LINE EDGE PROFILES [J].

REYNOLDS, JL ;

NEUREUTHER, AR ;

OLDHAM, WG .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06) :1772-1775

[9]

REYNOLDS JL, 1981, UCBERLM811 U CAL EL

[10] INTRODUCTION TO ION AND PLASMA ETCHING [J].

SOMEKH, S .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (05) :1003-1007

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