STRAINED P-CHANNEL INGASB/ALGASB MODULATION-DOPED FIELD-EFFECT TRANSISTORS

被引:3
作者
LOTT, JA
KLEM, JF
WENDT, JR
机构
[1] Sandia National Laboratories, Compound Semiconductor Research Laboratory, Albuquerque, New Mexico
关键词
FIELD-EFFECT TRANSISTORS; TRANSISTORS; SEMICONDUCTOR DEVICES AND MATERIALS;
D O I
10.1049/el:19920928
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Strained In0.25Ga0.75Sb p-channeL modulation-doped field-effect transistors with AL0.75GA0.25Sb Be-doped barrier layers are demonstrated. The extrinsic normalised transconductances for 1.2-mu-m gate length devices range from 33 to 51 mS/mm at 300 K and from 132 to 161 mS/mm at 77 K. At 300 K, the devices operated in depletion mode with a threshold voltage of approximately 0.3 V, a normalised output conductance of less than 3 mS/mm, and maximum drain current densities of approximately 20 mA/mm. The devices show promise for complementary heterojunction field-effect transistor logic applications.
引用
收藏
页码:1459 / 1460
页数:2
相关论文
共 10 条
[1]  
KLEM JF, 1992, 1992 EL MAT C CAMBR
[2]   HETEROJUNCTION BAND OFFSETS AND EFFECTIVE MASSES IN III-V QUATERNARY ALLOYS [J].
KRIJN, MPCM .
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1991, 6 (01) :27-31
[3]   HIGH-BREAKDOWN-VOLTAGE A1SBAS/INAS N-CHANNEL FIELD-EFFECT TRANSISTORS [J].
LI, X ;
LONGENBACH, KF ;
WANG, Y ;
WANG, WI .
IEEE ELECTRON DEVICE LETTERS, 1992, 13 (04) :192-194
[4]   A COMPLEMENTARY HETEROSTRUCTURE FIELD-EFFECT TRANSISTOR TECHNOLOGY BASED ON INAS/ALSB/GASB [J].
LONGENBACH, KF ;
BERESFORD, R ;
WANG, WI .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1990, 37 (10) :2265-2267
[5]   MOLECULAR-BEAM EPITAXY OF ALAS0.16SB0.84 AND AL0.8GA0.2AS0.14SB0.86 ON INAS SUBSTRATES [J].
LOTT, JA ;
DAWSON, LR ;
JONES, ED ;
KLEM, JF .
APPLIED PHYSICS LETTERS, 1990, 56 (13) :1242-1244
[6]   PARA-CHANNEL MODULATION-DOPED FIELD-EFFECT TRANSISTORS BASED ON ALSB0.9AS0.1/GASB [J].
LUO, LF ;
LONGENBACH, KF ;
WANG, WI .
IEEE ELECTRON DEVICE LETTERS, 1990, 11 (12) :567-569
[7]   EFFECTS OF INTERFACE LAYER SEQUENCING ON THE TRANSPORT-PROPERTIES OF INAS/ALSB QUANTUM-WELLS - EVIDENCE FOR ANTISITE DONORS AT THE INAS/ALSB INTERFACE [J].
TUTTLE, G ;
KROEMER, H ;
ENGLISH, JH .
JOURNAL OF APPLIED PHYSICS, 1990, 67 (06) :3032-3037
[8]   COMPLEMENTARY INAS N-CHANNEL AND GASB P-CHANNEL QUANTUM-WELL HETEROJUNCTION FIELD-EFFECT TRANSISTORS [J].
YOH, K ;
TANIGUCHI, H ;
KIYOMI, K ;
INOUE, M .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1991, 30 (12B) :3833-3836
[9]  
YOH K, 1992, 18TH INT S GALL ARS
[10]   GAAS/(IN,GA)AS, P-CHANNEL, MULTIPLE STRAINED QUANTUM WELL FIELD-EFFECT TRANSISTORS WITH HIGH TRANSCONDUCTANCE AND HIGH PEAK SATURATED DRAIN CURRENT [J].
ZIPPERIAN, TE ;
DAWSON, LR ;
DRUMMOND, TJ ;
SCHIRBER, JE ;
FRITZ, IJ .
APPLIED PHYSICS LETTERS, 1988, 52 (12) :975-977