SOME RECENT STUDIES OF VERY THIN SIO2-FILMS

被引：8

作者：

VANDERMEULEN, YJ ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1974年 / 11卷 / 06期

关键词：

D O I：

10.1116/1.1318717

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：985 / 989

页数：5

共 26 条

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