REACTIVELY SPUTTERED TIN, ZRN, AND HFN

被引：10

作者：

SPROUL, WD ^{[1
]}

机构：

[1] BORG WARNER CORP,RC INGERSOLL RES CTR,DES PLAINES,IL 60018

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1985年 / 3卷 / 03期

关键词：

D O I：

10.1116/1.572998

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：580 / 581

页数：2

共 8 条

[1] DEPOSITION RATE OF METALLIC THIN-FILMS IN REACTIVE SPUTTERING PROCESS [J].

ABE, T ;

YAMASHINA, T .

THIN SOLID FILMS, 1975, 30 (01) :19-27

[2] PREPARATION OF TITANIUM NITRIDE BY A PULSED DC MAGNETRON REACTIVE DEPOSITION TECHNIQUE USING THE MOVING MODE OF DEPOSITION [J].

ARONSON, AJ ;

CHEN, D ;

CLASS, WH .

THIN SOLID FILMS, 1980, 72 (03) :535-540

[3] ADVANCES IN HIGH-RATE SPUTTERING WITH MAGNETRON-PLASMATRON PROCESSING AND INSTRUMENTATION [J].

SCHILLER, S ;

HEISIG, U ;

GOEDICKE, K ;

SCHADE, K ;

TESCHNER, G ;

HENNEBERGER, J .

THIN SOLID FILMS, 1979, 64 (03) :455-467

[4]

Sproul W. D., 1984, U.S. Patent, Patent No. [4,428,811, 4428811]

[5] VERY HIGH-RATE REACTIVE SPUTTERING OF TIN, ZRN AND HFN [J].

SPROUL, WD .

THIN SOLID FILMS, 1983, 107 (02) :141-147

[6] HAFNIUM NITRIDE COATINGS PREPARED BY VERY HIGH RATE REACTIVE SPUTTERING. [J].

Sproul, William D. .

1600, (118)

[7]

SPROUL WD, THIN SOLID FILMS

[8]

Toth L.E, 1971, TRANSITION METAL CAR

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