REDUCED PHOTOINDUCED DEGRADATION IN CHEMICAL VAPOR-DEPOSITED HYDROGENATED AMORPHOUS-SILICON FILMS

被引:8
作者
CHU, TL
CHU, SS
BYLANDER, EG
ANG, ST
机构
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D O I
10.1063/1.99290
中图分类号
O59 [应用物理学];
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页码:807 / 809
页数:3
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