MATERIAL PROCESSING WITH BROAD-BEAM ION SOURCES

被引：43

作者：

HARPER, JME ^{[1
]}

CUOMO, JJ ^{[1
]}

KAUFMAN, HR ^{[1
]}

机构：

[1] COLORADO STATE UNIV, DEPT PHYS, FT COLLINS, CO 80523 USA

来源：

ANNUAL REVIEW OF MATERIALS SCIENCE | 1983年 / 13卷

关键词：

D O I：

10.1146/annurev.ms.13.080183.002213

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：413 / 439

页数：27

相关论文

共 78 条

[1] ION-BEAM DEPOSITION OF THIN FILMS OF DIAMONDLIKE CARBON
AISENBERG, S
CHABOT, R
[J]. JOURNAL OF APPLIED PHYSICS, 1971, 42 (07) : 2953 - +
[2] THIN-FILM DEPOSITION USING LOW-ENERGY ION-BEAMS .2. PB+ ION-BEAM DEPOSITION AND ANALYSIS OF DEPOSITS
AMANO, J
LAWSON, RPW
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (03): : 831 - 835
[3] ANDERSON HH, 1981, SPUTTERING PARTICLE, V1
[4] ION-BEAM DIVERGENCE CHARACTERISTICS OF 3-GRID ACCELERATOR SYSTEMS
ASTON, G
KAUFMAN, HR
[J]. AIAA JOURNAL, 1979, 17 (01) : 64 - 70
[5] ION INTERACTION WITH SOLIDS - SURFACE TEXTURING, SOME BULK EFFECTS, AND THEIR POSSIBLE APPLICATIONS
AUCIELLO, O
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 841 - 867
[6] AN ANALYTICAL FORMULA AND IMPORTANT PARAMETERS FOR LOW-ENERGY ION SPUTTERING
BOHDANSKY, J
ROTH, J
BAY, HL
[J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (05) : 2861 - 2865
[7] INVESTIGATION OF ION-BEAM-SPUTTERED NB-TI THIN-FILMS BY COMPLEMENTARY USE OF BACKSCATTERING AND NUCLEAR-REACTION MICROANALYSIS
BOUCHIER, D
GAUTHERIN, G
AGIUS, B
RIGO, S
[J]. JOURNAL OF APPLIED PHYSICS, 1978, 49 (12) : 5896 - 5902
[8] REACTIVE ION-BEAM ETCHING OF SIO2 AND POLYCRYSTALLINE SILICON
BROWN, DM
HEATH, BA
COUTUMAS, T
THOMPSON, GR
[J]. APPLIED PHYSICS LETTERS, 1980, 37 (02) : 159 - 161
[9] Carter G., 1968, ION BOMBARDMENT SOLI
[10] CASTELLANO RN, 1979, J VAC SCI TECHNOL, V16, P184, DOI 10.1116/1.569902

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