PATTERN PROFILE CONTROL OF POLYSILICON PLASMA-ETCHING

被引：12

作者：

KIMIZUKA, M

HIRATA, K

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1985年 / 3卷 / 01期

关键词：

D O I：

10.1116/1.583203

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

收藏

页码：16 / 19

页数：4

相关论文

共 14 条

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