X-RAY-DIFFRACTION FROM LOW-DIMENSIONAL STRUCTURES

被引:218
作者
FEWSTER, PF
机构
[1] Philips Res. Lab., Redhill
关键词
D O I
10.1088/0268-1242/8/11/001
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This review paper presents the applications of x-ray diffraction to routine measurements and the procedures for extending its capabilities of analysis to undertake a detailed structural investigation of low-dimensional structures. The uses and limitations of the familiar double-crystal diffractometer are discussed as are the advantages of 'reciprocal space mapping' with a multiple-crystal diffractometer. In general x-ray diffraction has been used for composition and thickness measurement in low-dimensional structures (LDS) and these aspects are covered, as well as the avoidance of the pitfalls associated with their determination. The possibilities for the use of x-ray diffraction methods to determine interface quality, the evolution of lattice relaxation, the detailed microstructure, etc, are discussed, with an indication of the limits of the techniques.
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页码:1915 / 1934
页数:20
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