CHLORINE SURFACE INTERACTION AND LASER-INDUCED SURFACE ETCHING REACTIONS

被引：53

作者：

SESSELMANN, W ^{[1
]}

CHUANG, TJ ^{[1
]}

机构：

[1] IBM CORP,RES LAB,SAN JOSE,CA 95193

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1985年 / 3卷 / 05期

关键词：

D O I：

10.1116/1.582975

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1507 / 1512

页数：6

共 38 条

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[8]

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[9]

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[10]

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