A MATHEMATICAL-MODEL FOR A PARALLEL PLATE PLASMA-ETCHING REACTOR

被引：37

作者：

ECONOMOU, DJ ^{[1
]}

ALKIRE, RC ^{[1
]}

机构：

[1] UNIV ILLINOIS,DEPT CHEM ENGN,URBANA,IL 61801

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1988年 / 135卷 / 11期

关键词：

D O I：

10.1149/1.2095434

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2786 / 2794

页数：9

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