GROWTH AND CHARACTERIZATION OF THIN GATE OXIDES BY DUAL TCE PROCESS

被引：7

作者：

LIU, BY

CHENG, YC

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1984年 / 131卷 / 03期

关键词：

D O I：

10.1149/1.2115673

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

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页码：683 / 686

页数：4

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