TEMPERATURE-DEPENDENCE OF THE STICKING PROBABILITY AND MOLECULAR-SIZE OF THE FILM GROWTH SPECIES IN AN ATMOSPHERIC CHEMICAL VAPOR-DEPOSITION PROCESS TO FORM AIN FROM ALCL3 AND NH3

The sticking probability and molecular size of the growth species were determined as a function of deposition temperature ranging from 700 to 950-degrees-C, in the AlN films prepared from AlCl3 and NH3. A novel method was developed, that includes the measurement of the film thickness profile on micron-sized trenches and the molecular diffusivity of the growth species. The molecular size was about 1 nm at 700-850-degrees-C and decreased gradually with increasing temperature. The sticking probability increased from 0.02 to 0.5 in the temperature range 700-950-degrees-C and, surprisingly, obeyed the Arrhenius law in spite of this large probability of sticking. The activation energy amounted to 136 kJ/mol.