Double heterostructure InGaAs-GaAs strained-layer single quantum well ridge waveguide lasers grown by molecular beam epitaxy were fabricated by using in situ laser monitored reactive ion etching to form the ridges. Continuous-wave threshold current as low as 3.5 mA was obtained on a ridge laser diode of 3.3-mu-m wide and 215-mu-m long having cleaved mirrors. The lasing wavelength is at 0.988-mu-m and the measured differential external quantum efficiency is 61%.