SPECULAR BEAM INTENSITY BEHAVIOR IN REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION DURING MOLECULAR-BEAM EPITAXIAL-GROWTH OF AL0.3GA0.7AS ON GAAS(100) AND IMPLICATIONS FOR INVERTED INTERFACES

被引:12
作者
CHO, NM [1 ]
CHEN, P [1 ]
MADHUKAR, A [1 ]
机构
[1] UNIV SO CALIF,DEPT PHYS,LOS ANGELES,CA 90089
关键词
D O I
10.1063/1.97683
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:1909 / 1911
页数:3
相关论文
共 9 条