CRYSTALLINE ANODIC SILICON DIOXIDE ON SILICON

被引：2

作者：

KONOVA, AA ^{[1
]}

MICHAILOV, MG ^{[1
]}

机构：

[1] BULGARIAN ACAD SCI,INST SOLID STATE PHYS,BU-113 SOFIA,BULGARIA

来源：

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1978年 / 50卷 / 02期

关键词：

D O I：

10.1002/pssa.2210500232

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：627 / 633

页数：7

共 13 条

[1] GROWTH OF THIN METAL FILMS UNDER APPLIED ELECTRIC FIELD (VACUUM DEPOSITION COALESCENCE OF NUCLEI E) [J].

CHOPRA, KL .

APPLIED PHYSICS LETTERS, 1965, 7 (05) :140-+

[2] INFLUENCE OF ELECTRIC FIELD ON GROWTH OF THIN METAL FILMS [J].

CHOPRA, KL .

JOURNAL OF APPLIED PHYSICS, 1966, 37 (06) :2249-&

[3]

Fehlner F. P., 1970, OXID MET, V2, P59

[4]

FEHLNER FP, 1970, OXIDATION METALS ALL

[5] ANODIC GROWTH MECHANISM OF OXIDES WITH LOW IONIC CONDUCTIVITY [J].

FRITZSCHE, CR .

SOLID STATE COMMUNICATIONS, 1968, 6 (06) :341-+

[6]

KONOVA AA, 1976, BULG J PHYS, V111, P63

[7] LOCAL CRYSTALLIZATION OF THERMAL OXIDE FILM OF SILICON [J].

NAGASIMA, N ;

ENARI, H .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1971, 10 (04) :441-&

[8] INDUCED CRYSTALLIZATION OF AMORPHOUS SILICON-OXIDE [J].

NEMETHSALLAY, M ;

BARNA, A ;

LORINCZY, A ;

SZEP, IC .

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1977, 43 (02) :K135-&

[9]

REVESZ AG, 1968, RCA REV, V29, P22

[10] TRACER INVESTIGATION OF HYDROXYLS IN SIO2 FILMS ON SILICON [J].

SCHMIDT, PF ;

ASHNER, JD .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (02) :325-&

← 1 2 →