SIO2 FILM STRESS-DISTRIBUTION DURING THERMAL-OXIDATION OF SI

被引：113

作者：

KOBEDA, E

IRENE, EA

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 02期

关键词：

D O I：

10.1116/1.584402

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：574 / 578

页数：5

共 31 条

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