CO2-LASER-INDUCED CHEMICAL VAPOR-DEPOSITION OF POLYCRYSTALLINE SILICON FROM SILANE

被引：18

作者：

TONNEAU, D

AUVERT, G

PAULEAU, Y

机构：

[1] CNET, Meylan, Fr, CNET, Meylan, Fr

来源：

THIN SOLID FILMS | 1987年 / 155卷 / 01期

关键词：

D O I：

10.1016/0040-6090(87)90454-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：75 / 86

页数：12

共 22 条

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