COMPARATIVE INVESTIGATION OF CF4-PLASMA, AR-PLASMA, AND DILUTE-HF-DIP CLEANING METHODS FOR (AL-SI)/N+SI CONTACTS

被引：6

作者：

FAITH, TJ

ONEILL, JJ

IRVEN, RS

VOSSEN, JL

SHAW, JM

THOMAS, JH

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1987年 / 134卷 / 03期

关键词：

D O I：

10.1149/1.2100528

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：665 / 668

页数：4

共 13 条

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