OPTICAL-PROPERTIES OF PLASMA-DEPOSITED SILICON-OXYGEN ALLOY-FILMS

被引:17
作者
HAGA, K [1 ]
WATANABE, H [1 ]
机构
[1] SENDAI NATL COLL TECHNOL,SENDAI 98931,JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1990年 / 29卷 / 04期
关键词
D O I
10.1143/JJAP.29.636
中图分类号
O59 [应用物理学];
学科分类号
摘要
Hydrogenated amorphous silicon-oxygen alloy films are prepared by r.f. glow discharge decomposition of a SiH4–CO2 gas mixture. The optical properties of these films are discussed in terms of oxygen content. The Lorentz-Lorenz theory is the best approximation to the dependence of the refractive index on the oxygen content. The existence of silicon-rich and oxygen-rich phases is probable in the amorphous alloy films. © 1990 The Japan Society of Applied Physics.
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页码:636 / 639
页数:4
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