THE ROLE OF GAS-ADSORPTION IN ION-BEAM-INDUCED DEPOSITION OF GOLD

被引:16
作者
DUBNER, AD [1 ]
WAGNER, A [1 ]
机构
[1] IBM CORP,THOMAS J WATSON RES CTR,DIV RES,YORKTOWN HTS,NY 10598
关键词
D O I
10.1063/1.343512
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:870 / 874
页数:5
相关论文
共 16 条
[1]   LASER CHEMICAL VAPOR-DEPOSITION - A TECHNIQUE FOR SELECTIVE AREA DEPOSITION [J].
ALLEN, SD .
JOURNAL OF APPLIED PHYSICS, 1981, 52 (11) :6501-6505
[3]   Adsorption of gases in multimolecular layers [J].
Brunauer, S ;
Emmett, PH ;
Teller, E .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1938, 60 :309-319
[4]   INSITU MEASUREMENT OF ION-BEAM-INDUCED DEPOSITION OF GOLD [J].
DUBNER, AD ;
WAGNER, A .
JOURNAL OF APPLIED PHYSICS, 1989, 65 (09) :3636-3643
[5]  
EHRLICH DJ, 1983, J VAC SCI TECHNOL B, V1, P969, DOI 10.1116/1.582718
[6]  
Gamo K., 1986, Microelectronic Engineering, V5, P163, DOI 10.1016/0167-9317(86)90043-2
[7]   ION-BEAM ASSISTED DEPOSITION OF METAL ORGANIC FILMS USING FOCUSED ION-BEAMS [J].
GAMO, K ;
TAKAKURA, N ;
SAMOTO, N ;
SHIMIZU, R ;
NAMBA, S .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1984, 23 (05) :L293-L295
[8]   INTEGRATED-CIRCUIT REPAIR USING FOCUSED ION-BEAM MILLING [J].
HARRIOTT, LR ;
WAGNER, A ;
FRITZ, F .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (01) :181-184
[9]   APPLICATION OF A FOCUSED ION-BEAM SYSTEM TO DEFECT REPAIR OF VLSI MASKS [J].
HEARD, PJ ;
CLEAVER, JRA ;
AHMED, H .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01) :87-90
[10]   PATTERNED ALUMINUM GROWTH VIA EXCIMER LASER ACTIVATED METALORGANIC CHEMICAL VAPOR-DEPOSITION [J].
HIGASHI, GS ;
FLEMING, CG .
APPLIED PHYSICS LETTERS, 1986, 48 (16) :1051-1053