INSITU MEASUREMENT OF ION-BEAM-INDUCED DEPOSITION OF GOLD

被引：19

作者：

DUBNER, AD ^{[1
]}

WAGNER, A ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,DIV RES,YORKTOWN HTS,NY 10598

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 65卷 / 09期

关键词：

D O I：

10.1063/1.342612

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3636 / 3643

页数：8

共 17 条

[1] LASER CHEMICAL VAPOR-DEPOSITION - A TECHNIQUE FOR SELECTIVE AREA DEPOSITION [J].

ALLEN, SD .

JOURNAL OF APPLIED PHYSICS, 1981, 52 (11) :6501-6505

[2] LASER CHEMICAL VAPOR-DEPOSITION OF GOLD - THE EFFECT OF ORGANOMETALLIC STRUCTURE [J].

BAUM, TH .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (10) :2616-2619

[3]

EHRLICH DJ, 1983, J VAC SCI TECHNOL B, V1, P969, DOI 10.1116/1.582718

[4]

Gamo K., 1986, Microelectronic Engineering, V5, P163, DOI 10.1016/0167-9317(86)90043-2

[5] ION-BEAM ASSISTED DEPOSITION OF METAL ORGANIC FILMS USING FOCUSED ION-BEAMS [J].

GAMO, K ;

TAKAKURA, N ;

SAMOTO, N ;

SHIMIZU, R ;

NAMBA, S .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1984, 23 (05) :L293-L295

[6] INTEGRATED-CIRCUIT REPAIR USING FOCUSED ION-BEAM MILLING [J].

HARRIOTT, LR ;

WAGNER, A ;

FRITZ, F .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (01) :181-184

[7] APPLICATION OF A FOCUSED ION-BEAM SYSTEM TO DEFECT REPAIR OF VLSI MASKS [J].

HEARD, PJ ;

CLEAVER, JRA ;

AHMED, H .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01) :87-90

[8] PATTERNED ALUMINUM GROWTH VIA EXCIMER LASER ACTIVATED METALORGANIC CHEMICAL VAPOR-DEPOSITION [J].

HIGASHI, GS ;

FLEMING, CG .

APPLIED PHYSICS LETTERS, 1986, 48 (16) :1051-1053

[9] HIGH-RESOLUTION ELECTRON-BEAM INDUCED DEPOSITION [J].

KOOPS, HWP ;

WEIEL, R ;

KERN, DP ;

BAUM, TH .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (01) :477-481

[10] ELECTRON-BEAM INDUCED SURFACE NUCLEATION AND LOW-TEMPERATURE DECOMPOSITION OF METAL-CARBONYLS [J].

KUNZ, RR ;

MAYER, TM .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (05) :1557-1564

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