EBES4 - A NEW ELECTRON-BEAM EXPOSURE SYSTEM

被引：16

作者：

ALLES, DS

BIDDICK, CJ

BRUNING, JH

CLEMENS, JT

COLLIER, RJ

GERE, EA

HARRIOTT, LR

LEONE, F

LIU, R

MULROONEY, TJ

NIELSEN, RJ

PARAS, N

RICHMAN, RM

ROSE, CM

ROSENFELD, DP

SMITH, DEA

THOMSON, MGR

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 01期

关键词：

D O I：

10.1116/1.583925

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：47 / 52

页数：6

共 9 条

[1]

ALLES DS, 1975, INT ELECTRON DEVIC S, P1

[2]

COGSWELL G, 1978, 8TH P INT C EL ION B, P117

[3] EBES - PRACTICAL ELECTRON LITHOGRAPHIC SYSTEM [J].

HERRIOTT, DR ;

COLLIER, RJ ;

ALLES, DS ;

STAFFORD, JW .

IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) :385-392

[4] AN ELECTRON-BEAM LITHOGRAPHY SYSTEM FOR SUB-MICRON VHSIC DEVICE FABRICATION [J].

KING, HJ ;

MERRITT, PE ;

OTTO, OW ;

OZDEMIR, FS ;

PASIECZNIK, J ;

CARROLL, AM ;

CAVAN, DL ;

ECKES, W ;

LIN, LH ;

VENEKLASEN, L ;

WIESNER, JC .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01) :106-111

[5] EL-3 - A HIGH THROUGHPUT, HIGH-RESOLUTION E-BEAM LITHOGRAPHY TOOL [J].

MOORE, RD ;

CACCOMA, GA ;

PFEIFFER, HC ;

WEBER, EV ;

WOODARD, OC .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04) :950-952

[6] A HYDRAULIC X-Y STAGE SYSTEM FOR APPLICATION IN ELECTRON-BEAM EXPOSURE SYSTEMS [J].

NIELSEN, RJ ;

BRUNING, JH ;

RICHMAN, RM ;

BIDDICK, CJ ;

GIACCHI, J ;

KOSSYK, GJW ;

BUSH, DR ;

BARNA, SJ ;

ALLES, DS .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (01) :57-60

[7] PROXIMITY EFFECT CORRECTION FOR ELECTRON-BEAM LITHOGRAPHY BY EQUALIZATION OF BACKGROUND DOSE [J].

OWEN, G ;

RISSMAN, P .

JOURNAL OF APPLIED PHYSICS, 1983, 54 (06) :3573-3581

[8] DOUBLE-APERTURE METHOD OF PRODUCING VARIABLY SHAPED WRITING SPOTS FOR ELECTRON LITHOGRAPHY [J].

THOMSON, MGR ;

COLLIER, RJ ;

HERRIOTT, DR .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03) :891-895

[9] THE EBES4 ELECTRON-BEAM COLUMN [J].

THOMSON, MGR ;

LIU, R ;

COLLIER, RJ ;

CARROLL, HT ;

DOHERTY, ET ;

MURRAY, RG .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (01) :53-56

← 1 →