HARDNESS VARIABILITY IN COMMERCIAL TECHNOLOGIES

被引:36
作者
SHANEYFELT, MR
WINOKUR, PS
MEISENHEIMER, TL
SEXTON, FW
ROESKE, SB
KNOLL, MG
机构
[1] Sandia National Laboratories, Albuquerque
关键词
D O I
10.1109/23.340613
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The radiation hardness of commercial Floating Gate 256K E(2)PROMs from a single diffusion lot was observed to vary between 5 to 25 krad(Si) when irradiated at a low dose rate of 64 mrad(Si)/s. Additional variations in E(2)PROM hardness were found to depend on bias condition and failure mode (i.e., inability to read or write the memory), as well as the foundry at which the part was manufactured. This variability is related to system requirements, and it is shown that hardness level and variability affect the allowable mode of operation for E(2)PROMs in space applications. The radiation hardness of commercial 1-Mbit CMOS SRAMs from Micron, Hitachi, and Sony irradiated at 147 rad(Si)/s was approximately 12, 13, and 19 krad(Si), respectively. These failure levels appear to be related to increases in leakage current during irradiation. Hardness of SRAMs from each manufacturer varied by less than 20%, but differences between manufacturers are significant. The Qualified Manufacturer's List approach to radiation hardness assurance is suggested as a way to reduce variability and to improve the hardness level of commercial technologies.
引用
收藏
页码:2536 / 2543
页数:8
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