DEPTH PROFILING OF SODIUM IN SIO2-FILMS BY SECONDARY ION MASS-SPECTROMETRY

[1] NEGATIVE ION BOMBARDMENT OF INSULATORS TO ALLEVIATE SURFACE CHARGE-UP [J]. JOURNAL OF APPLIED PHYSICS, 1969, 40 (08) : 3419 - +

[2] Bach H., 1976, Radiation Effects, V28, P215, DOI 10.1080/00337577608237442

[3] SODIUM MOBILITY IN IRRADIATED SIO2 [J]. IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1974, NS21 (06) : 67 - 72

[4] DEPENDENCE OF MOS DEVICE RADIATION-SENSITIVITY ON OXIDE IMPURITIES [J]. IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1972, NS19 (06) : 256 - 263

[5] DIRECT MEASUREMENT OF NA+ ION MOBILITY IN SIO2-FILMS [J]. THIN SOLID FILMS, 1976, 36 (02) : 435 - 439

[6] MOBILIZATION OF SODIUM IN SIO2-FILMS BY ION-BOMBARDMENT [J]. PHYSICAL REVIEW B, 1974, 10 (06) : 2632 - 2641

[7] SECONDARY ION QUADRUPOLE MASS-SPECTROMETER FOR DEPTH PROFILING-DESIGN AND PERFORMANCE EVALUATION [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1978, 49 (04) : 477 - 485

[8] DEPTH PROFILES OF SODIUM AND CALCIUM IN GLASSES - COMPARISON OF SECONDARY ION MASS ANALYSIS AND AUGER SPECTROMETRY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (01): : 35 - 38

[9] MASSEY HSW, 1952, ELECTRONIC IONIC IMP, P311

[10] ION NEUTRALIZATION PROCESSES AT INSULATOR SURFACES AND CONSEQUENT IMPURITY MIGRATION EFFECTS IN SIO2 FILMS [J]. PHYSICAL REVIEW LETTERS, 1973, 30 (13) : 614 - 617

[1] NEGATIVE ION BOMBARDMENT OF INSULATORS TO ALLEVIATE SURFACE CHARGE-UP [J]. JOURNAL OF APPLIED PHYSICS, 1969, 40 (08) : 3419 - +

[2] Bach H., 1976, Radiation Effects, V28, P215, DOI 10.1080/00337577608237442

[3] SODIUM MOBILITY IN IRRADIATED SIO2 [J]. IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1974, NS21 (06) : 67 - 72

[4] DEPENDENCE OF MOS DEVICE RADIATION-SENSITIVITY ON OXIDE IMPURITIES [J]. IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1972, NS19 (06) : 256 - 263

[5] DIRECT MEASUREMENT OF NA+ ION MOBILITY IN SIO2-FILMS [J]. THIN SOLID FILMS, 1976, 36 (02) : 435 - 439

[6] MOBILIZATION OF SODIUM IN SIO2-FILMS BY ION-BOMBARDMENT [J]. PHYSICAL REVIEW B, 1974, 10 (06) : 2632 - 2641

[7] SECONDARY ION QUADRUPOLE MASS-SPECTROMETER FOR DEPTH PROFILING-DESIGN AND PERFORMANCE EVALUATION [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1978, 49 (04) : 477 - 485

[8] DEPTH PROFILES OF SODIUM AND CALCIUM IN GLASSES - COMPARISON OF SECONDARY ION MASS ANALYSIS AND AUGER SPECTROMETRY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (01): : 35 - 38

[9] MASSEY HSW, 1952, ELECTRONIC IONIC IMP, P311

[10] ION NEUTRALIZATION PROCESSES AT INSULATOR SURFACES AND CONSEQUENT IMPURITY MIGRATION EFFECTS IN SIO2 FILMS [J]. PHYSICAL REVIEW LETTERS, 1973, 30 (13) : 614 - 617