THIN-FILM ANALYSIS USING RUTHERFORD SCATTERING

被引：10

作者：

MORGAN, DV ^{[1
]}

机构：

[1] UNIV LEEDS,DEPT ELECT & ELECTR ENGN,LEEDS LS2 9JT,YORKSHIRE,ENGLAND

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1974年 / 7卷 / 05期

关键词：

D O I：

10.1088/0022-3727/7/5/301

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：653 / 662

页数：10

共 14 条

[1]

AMSEL G, 1973, P CNRS INT COLLOQ AC

[2]

AMSEL G, 1973, ENS10 REP

[3]

BOGH E, 1969, P R SOC A, V311, P63

[4] GROWTH KINETICS OBSERVED IN FORMATION OF METAL SILICIDES ON SILICON [J].

BOWER, RW ;

MAYER, JW .

APPLIED PHYSICS LETTERS, 1972, 20 (09) :359-&

[5] ANALYSIS OF EVAPORATED SILICON OXIDE FILMS BY MEANS OF (D,P) NUCLEAR REACTIONS AND INFRARED SPECTROPHOTOMETRY [J].

CACHARD, A ;

ROGER, JA ;

PIVOT, J ;

DUPUY, CHS .

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1971, 5 (03) :637-&

[6] PRINCIPLES AND APPLICATIONS OF ION-BEAM TECHNIQUES FOR ANALYSIS OF SOLIDS AND THIN-FILMS [J].

CHU, WK ;

MAYER, JW ;

NICOLET, MA ;

BUCK, TM ;

AMSEL, G ;

EISEN, F .

THIN SOLID FILMS, 1973, 17 (01) :1-41

[7] COMMENTS ON ELECTRON-EMISSION FROM METAL-CDS-INSULATOR-METAL AND METAL-INSULATOR-CDS-METAL THIN-FILM DEVICES [J].

COLLINS, RA .

THIN SOLID FILMS, 1972, 11 (01) :187-&

[8] PROTON MICROBEAMS, THEIR PRODUCTION AND USE [J].

COOKSON, JA ;

FERGUSON, AT ;

PILLING, FD .

JOURNAL OF RADIOANALYTICAL CHEMISTRY, 1972, 12 (01) :39-52

[9] ELECTRICAL PHENOMENA IN AMORPHOUS OXIDE FILMS [J].

DEARNALEY, G ;

STONEHAM, AM ;

MORGAN, DV .

REPORTS ON PROGRESS IN PHYSICS, 1970, 33 (11) :1129-+

[10]

DEARNALEY G, 1972, 1972 P INT CONT ION

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