ION-BOMBARDMENT EFFECT ON PREFERRED ORIENTATION IN NI-FE FILM FORMED BY ION-BEAM SPUTTERING

被引：17

作者：

NAGAI, Y

TAGO, A

TOSHIMA, T

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1987年 / 5卷 / 01期

关键词：

D O I：

10.1116/1.574138

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：61 / 66

页数：6

共 24 条

[1]

ADAMSKY RF, 1960, J APPL PHYS S, V3, pS289

[2] RADIO-FREQUENCY SPUTTERED NIFE FILMS ON AU [J].

AHN, KY .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (02) :626-628

[3] EFFECT OF ION-BOMBARDMENT DURING DEPOSITION ON THICK METAL AND CERAMIC DEPOSITS [J].

BLAND, RD ;

KOMINIAK, GJ ;

MATTOX, DM .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (04) :671-674

[4]

Bradley AJ, 1937, PHILOS MAG, V23, P545

[5] THE MAGNETORESISTIVITY, STRUCTURE, AND MAGNETIC-ANISOTROPY OF RF SPUTTERED AND E-BEAM EVAPORATED NIFE FILMS [J].

CHI, GC ;

MOGAB, CJ ;

BURTHERUS, AD ;

LEHNER, AG .

JOURNAL OF APPLIED PHYSICS, 1981, 52 (03) :2439-2441

[6] NITROGEN-INDUCED FCC PHASE IN RF SPUTTERED CO-CR FILMS HAVING THE HCP PHASE AND PERPENDICULAR MAGNETIC-ANISOTROPY [J].

COUGHLIN, TM ;

WUORI, ER ;

JUDY, JH .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (02) :171-174

[7] THIN-FILM ANNEALING BY ION-BOMBARDMENT [J].

HIRSCH, EH ;

VARGA, IK .

THIN SOLID FILMS, 1980, 69 (01) :99-105

[8] EFFECT OF ION IRRADIATION ON ADHERENCE OF GERMANIUM FILMS [J].

HIRSCH, EH ;

VARGA, IK .

THIN SOLID FILMS, 1978, 52 (03) :445-452

[9] PERPENDICULAR MAGNETIC RECORDING WITH A COMPOSITE ANISOTROPY FILM [J].

IWASAKI, S ;

NAKAMURA, Y ;

OUCHI, K .

IEEE TRANSACTIONS ON MAGNETICS, 1979, 15 (06) :1456-1458

[10]

JHINGAN AK, 1984, IEEE T MAGN, V20, P779, DOI 10.1109/TMAG.1984.1063378

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