SOFT-X-RAY PROJECTION LITHOGRAPHY USING A 1-1 RING FIELD OPTICAL-SYSTEM

被引：5

作者：

MACDOWELL, AA

BJORKHOLM, JE

BOKOR, J

EICHNER, L

FREEMAN, RR

MANSFIELD, WM

PASTALAN, J

SZETO, LH

TENNANT, DM

WOOD, OR

JEWELL, TE

WASKIEWICZ, WK

WHITE, DL

WINDT, DL

SILFVAST, WT

ZERNIKE, F

机构：

[1] UNIV CENT FLORIDA,ORLANDO,FL 32826

[2] SVG LITHOGRAPHY SYST INC,WILTON,CT 06897

[3] AT&T BELL LABS,HOLMDEL,NJ 07733

[4] AT&T BELL LABS,MURRAY HILL,NJ 07974

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1991年 / 9卷 / 06期

关键词：

D O I：

10.1116/1.585315

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

An iridium-coated Offner 1:1 ring field camera has been used to carry out projection lithography using 42 nm light from an undulator in the vacuum ultra violet storage ring at Brookhaven National Laboratory. Near-diffraction-limited resolution has been obtained showing features as small as 0.2-mu-m within a 2 mm x 0.25 mm image field. Images of both transmission and reflection masks have been obtained. The impact of source coherence on imagery has been investigated. Hydrocarbon contamination problems experienced in this photon energy range have been investigated and possible solutions are suggested.

引用

页码：3193 / 3197

页数：5

共 11 条

[1] REDUCTION IMAGING AT 14 NM USING MULTILAYER-COATED OPTICS - PRINTING OF FEATURES SMALLER THAN 0.1-MU-M [J].

BJORKHOLM, JE ;

BOKOR, J ;

EICHNER, L ;

FREEMAN, RR ;

GREGUS, J ;

JEWELL, TE ;

MANSFIELD, WM ;

MACDOWELL, AA ;

RAAB, EL ;

SILFVAST, WT ;

SZETO, LH ;

TENNANT, DM ;

WASKIEWICZ, WK ;

WHITE, DL ;

WINDT, DL ;

WOOD, OR ;

BRUNING, JH .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1990, 8 (06) :1509-1513

[2]

FAUCHET AM, 1985, NATL SYNCHROTRON LIG, P137

[3] SOFT-X-RAY PROJECTION LITHOGRAPHY USING AN X-RAY REDUCTION CAMERA [J].

HAWRYLUK, AM ;

SEPPALA, LG .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06) :2162-2166

[4]

HENKE BL, 1988, LBL26295 PREL REP

[5] SOFT-X-RAY REDUCTION LITHOGRAPHY USING MULTILAYER MIRRORS [J].

KINOSHITA, H ;

KURIHARA, K ;

ISHII, Y ;

TORII, Y .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (06) :1648-1651

[6]

MANSFIELD WM, IN PRESS SOFT XRAY P

[7] NEW CONCEPTS IN PROJECTION MASK ALIGNERS [J].

OFFNER, A .

OPTICAL ENGINEERING, 1975, 14 (02) :130-132

[8] Tenth micron lithography with a 10 Hz 37-2 nm sodium [J].

Silvast, W.T. ;

Wood II, O.R. .

Microelectronic Engineering, 1988, 8 (1-2) :3-11

[9] OPTICAL-CONSTANTS FOR THIN-FILMS OF C, DIAMOND, AL, SI, AND CVD SIC FROM 24-A TO 1216-A [J].

WINDT, DL ;

CASH, WC ;

SCOTT, M ;

ARENDT, P ;

NEWNAM, B ;

FISHER, RF ;

SWARTZLANDER, AB ;

TAKACS, PZ ;

PINNEO, JM .

APPLIED OPTICS, 1988, 27 (02) :279-295

[10] OPTICAL-CONSTANTS FOR THIN-FILMS OF TI, ZR, NB, MO, RU, RH, PD, AG, HF, TA, W, RE, IR, OS, PT, AND AU FROM 24-A TO 1216-A [J].

WINDT, DL ;

CASH, WC ;

SCOTT, M ;

ARENDT, P ;

NEWMAN, B ;

FISHER, RF ;

SWARTZLANDER, AB .

APPLIED OPTICS, 1988, 27 (02) :246-278

← 1 2 →