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[71] HOFFMAN DW, 1975, SURF SCI, V50, P29, DOI 10.1016/0039-6028(75)90171-5

[72] ANALYTIC CORRECTION OF EDGE EFFECTS IN ION-BEAM SPUTTERED DEPTH PROFILES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (02): : 613 - 620

[73] Hofmann S., 1980, Surface and Interface Analysis, V2, P148, DOI 10.1002/sia.740020406

[74] SURFACE AND THIN-FILM ANALYSIS - CONCEPTS, CAPABILITIES AND LIMITATIONS [J]. TALANTA, 1979, 26 (08) : 665 - 673

[75] DEPTH RESOLUTION IN SPUTTER PROFILING [J]. APPLIED PHYSICS, 1977, 13 (02): : 205 - 207

[76] CHARACTERIZATION OF ELECTRONIC DEVICES AND MATERIALS BY SURFACE-SENSITIVE ANALYTICAL TECHNIQUES [J]. APPLICATIONS OF SURFACE SCIENCE, 1980, 4 (3-4): : 410 - 444

[77] HOLLOWAY PH, 1980, ADV ELECTRON EL PHYS, V54, P241

[78] ISHITANI T, 1975, APPL PHYS, V6, P241, DOI 10.1007/BF00883758

[79] EVAPORATED INHOMOGENEOUS THIN FILMS [J]. APPLIED OPTICS, 1966, 5 (01) : 29 - +

[80] Jacobsson R., 1975, PHYS THIN FILMS, V8, P51

[71] HOFFMAN DW, 1975, SURF SCI, V50, P29, DOI 10.1016/0039-6028(75)90171-5

[72] ANALYTIC CORRECTION OF EDGE EFFECTS IN ION-BEAM SPUTTERED DEPTH PROFILES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (02): : 613 - 620

[73] Hofmann S., 1980, Surface and Interface Analysis, V2, P148, DOI 10.1002/sia.740020406

[74] SURFACE AND THIN-FILM ANALYSIS - CONCEPTS, CAPABILITIES AND LIMITATIONS [J]. TALANTA, 1979, 26 (08) : 665 - 673

[75] DEPTH RESOLUTION IN SPUTTER PROFILING [J]. APPLIED PHYSICS, 1977, 13 (02): : 205 - 207

[76] CHARACTERIZATION OF ELECTRONIC DEVICES AND MATERIALS BY SURFACE-SENSITIVE ANALYTICAL TECHNIQUES [J]. APPLICATIONS OF SURFACE SCIENCE, 1980, 4 (3-4): : 410 - 444

[77] HOLLOWAY PH, 1980, ADV ELECTRON EL PHYS, V54, P241

[78] ISHITANI T, 1975, APPL PHYS, V6, P241, DOI 10.1007/BF00883758

[79] EVAPORATED INHOMOGENEOUS THIN FILMS [J]. APPLIED OPTICS, 1966, 5 (01) : 29 - +

[80] Jacobsson R., 1975, PHYS THIN FILMS, V8, P51