ANODIC-OXIDATION OF GAAS USING OXYGEN PLASMA

被引：24

作者：

YAMASAKI, K

SUGANO, T

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1978年 / 17卷

关键词：

D O I：

10.7567/JJAPS.17S1.321

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：321 / 326

页数：6

相关论文

共 6 条

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[2] ANODIC-OXIDATION OF GAAS IN MIXED SOLUTIONS OF GLYCOL AND WATER
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[3] THERMAL-OXIDATION OF GAAS
KOSHIGA, F
SUGANO, T
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1977, 16 : 465 - 469
[4] KOSHIGA F, 1976, 8TH P C SOL STAT DEV
[5] OXIDATION OF GAAS1-XPX SURFACE BY OXYGEN PLASMA AND PROPERTIES OF OXIDE FILM
SUGANO, T
MORI, Y
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1974, 121 (01) : 113 - 118
[6] OXIDE FILMS GROWN ON GAAS IN AN OXYGEN PLASMA
WEINREICH, OA
[J]. JOURNAL OF APPLIED PHYSICS, 1966, 37 (07) : 2924 - +