THE EFFECT OF ELECTRODE AREA RATIO ON LOW-FREQUENCY GLOW-DISCHARGES

被引：23

作者：

GOTTSCHO, RA

SCHELLER, GR

STONEBACK, D

INTRATOR, T

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 66卷 / 02期

关键词：

D O I：

10.1063/1.343564

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：492 / 500

页数：9

共 52 条

[1] TIME-RESOLVED PLASMA PARAMETER MEASUREMENTS IN A LOW-FREQUENCY RF GLOW-DISCHARGE [J].

ANDERSON, CA ;

GRAHAM, WG ;

HOPKINS, MB .

APPLIED PHYSICS LETTERS, 1988, 52 (10) :783-785

[2] LARGE-SIGNAL TIME-DOMAIN MODELING OF LOW-PRESSURE RF GLOW-DISCHARGES [J].

BARNES, MS ;

COLTER, TJ ;

ELTA, ME .

JOURNAL OF APPLIED PHYSICS, 1987, 61 (01) :81-89

[3] A TWO-DIMENSIONAL MODEL OF DC GLOW-DISCHARGES [J].

BOEUF, JP .

JOURNAL OF APPLIED PHYSICS, 1988, 63 (05) :1342-1349

[4] NUMERICAL-MODEL OF RF GLOW-DISCHARGES [J].

BOEUF, JP .

PHYSICAL REVIEW A, 1987, 36 (06) :2782-2792

[5]

BOEUF JP, 1988, INTERACTIONS PLASMA, P113

[6] PROFILE CONTROL WITH DC BIAS IN PLASMA-ETCHING [J].

BRUCE, RH ;

REINBERG, AR .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (02) :393-396

[7]

Chapman B., 1980, GLOW DISCHARGE PROCE

[8]

Coburn J.W., 1982, PLASMA CHEM PLASMA P, V2, P1, DOI 10.1007/BF00566856

[9] POSITIVE-ION BOMBARDMENT OF SUBSTRATES IN RF DIODE GLOW-DISCHARGE SPUTTERING [J].

COBURN, JW ;

KAY, E .

JOURNAL OF APPLIED PHYSICS, 1972, 43 (12) :4965-4971

[10] SURFACE STRUCTURAL DAMAGE PRODUCED IN INP(100) BY RF PLASMA OR SPUTTER DEPOSITION [J].

DAUTREMONTSMITH, WC ;

FELDMAN, LC .

THIN SOLID FILMS, 1983, 105 (02) :187-196

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