RF-SPUTTERED B-DOPED A-SI-H AND A-SI-B-H ALLOYS

被引：14

作者：

JOUSSE, D ^{[1
]}

BUSTARRET, E ^{[1
]}

DENEUVILLE, A ^{[1
]}

STOQUERT, JP ^{[1
]}

机构：

[1] CTR RECH NUCL,PHASE LAB,F-67037 STRASBOURG,FRANCE

来源：

PHYSICAL REVIEW B | 1986年 / 34卷 / 10期

关键词：

D O I：

10.1103/PhysRevB.34.7031

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：7031 / 7044

页数：14

共 65 条

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