PHOTOCHEMICAL VAPOR-DEPOSITION OF ALUMINUM THIN-FILMS USING DIMETHYLALUMINUM HYDRIDE

被引：10

作者：

HANABUSA, M

HAYAKAWA, K

OIKAWA, A

MAEDA, K

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1988年 / 27卷 / 08期

关键词：

D O I：

10.1143/JJAP.27.L1392

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：L1392 / L1394

页数：3

共 11 条

[1] THE GROWTH AND CHARACTERIZATION OF AIGAAS USING DIMETHYL ALUMINUM-HYDRIDE [J].

BHAT, R ;

KOZA, MA ;

CHANG, CC ;

SCHWARZ, SA ;

HARRIS, TD .

JOURNAL OF CRYSTAL GROWTH, 1986, 77 (1-3) :7-10

[2] LASER PROJECTION PATTERNED ALUMINUM METALLIZATION FOR INTEGRATED-CIRCUIT APPLICATIONS [J].

BLONDER, GE ;

HIGASHI, GS ;

FLEMING, CG .

APPLIED PHYSICS LETTERS, 1987, 50 (12) :766-768

[3] LASER DIRECT WRITING OF ALUMINUM CONDUCTORS [J].

CACOURIS, T ;

SCELSI, G ;

SHAW, P ;

SCARMOZZINO, R ;

OSGOOD, RM ;

KRCHNAVEK, RR .

APPLIED PHYSICS LETTERS, 1988, 52 (22) :1865-1867

[4] VACUUM ULTRAVIOLET DRIVEN CHEMICAL VAPOR-DEPOSITION OF LOCALIZED ALUMINUM THIN-FILMS [J].

CALLOWAY, AR ;

GALANTOWICZ, TA ;

FENNER, WR .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (02) :534-536

[5]

Hanabusa M., 1987, Material Science Reports, V2, P51, DOI 10.1016/S0920-2307(87)80002-6

[6] INVESTIGATION OF THE SURFACE PHOTOCHEMICAL BASIS FOR METAL-FILM NUCLEATION IN LASER CHEMICAL VAPOR-DEPOSITION [J].

HIGASHI, GS ;

ROTHBERG, LJ .

APPLIED PHYSICS LETTERS, 1985, 47 (12) :1288-1290

[7] MECHANISMS OF AL FILM GROWTH BY ULTRAVIOLET-LASER PHOTOLYSIS OF TRIMETHYLALUMINUM [J].

MOTOOKA, T ;

GORBATKIN, S ;

LUBBEN, D ;

ERES, D ;

GREENE, JE .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (06) :3146-3152

[8] UV-LASER PHOTOLYSIS OF TRIMETHYLALUMINUM FOR AL FILM GROWTH [J].

MOTOOKA, T ;

GORBATKIN, S ;

LUBBEN, D ;

GREENE, JE .

JOURNAL OF APPLIED PHYSICS, 1985, 58 (11) :4397-4401

[9] PHOTODEPOSITION OF ALUMINUM-OXIDE AND ALUMINUM THIN-FILMS [J].

SOLANKI, R ;

RITCHIE, WH ;

COLLINS, GJ .

APPLIED PHYSICS LETTERS, 1983, 43 (05) :454-456

[10] PATTERNED PHOTONUCLEATION OF CHEMICAL VAPOR-DEPOSITION OF AL BY UV-LASER PHOTODEPOSITION [J].

TSAO, JY ;

EHRLICH, DJ .

APPLIED PHYSICS LETTERS, 1984, 45 (06) :617-619

← 1 2 →