P-N-JUNCTION DIODE MADE OF SEMICONDUCTING DIAMOND FILMS

被引:29
作者
OKANO, K
KIYOTA, H
IWASAKI, T
KUROSU, T
IIDA, M
NAKAMURA, T
机构
[1] Department of Electronics, School of Engineering, Tokai University, Hiratsuka, Kanagawa 259-12
关键词
D O I
10.1063/1.104506
中图分类号
O59 [应用物理学];
学科分类号
摘要
A diamond p-n junction diode fabricated by the chemical vapor deposition technique, shows distinct rectification characteristics. From the electron beam induced current measurement, the existence of a depletion region or a space-charge region around the interface between the n- and p-type semiconducting diamond layers was identified.
引用
收藏
页码:840 / 841
页数:2
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