THEORY OF LOCAL-PHONON-COUPLED LOW-ENERGY ANHARMONIC EXCITATION OF THE INTERSTITIAL OXYGEN IN SILICON

被引:59
作者
YAMADAKANETA, H [1 ]
KANETA, C [1 ]
OGAWA, T [1 ]
机构
[1] FUJITSU LABS LTD,SEMICOND DEVICES LAB,ATSUGI 24301,JAPAN
来源
PHYSICAL REVIEW B | 1990年 / 42卷 / 15期
关键词
D O I
10.1103/PhysRevB.42.9650
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The previous model for the low-energy anharmonic excitation of the interstitial oxygen in silicon [D. R. Bosomworth, W. Hayes, A. R. L. Spray, and G. D. Watkins, Proc. R. Soc. London, Ser. A 317, 133 (1970)] is expanded so that the coupling to the local phonon is included. The result of the calculation explains the previously observed absorption peaks of O16 and O18 in the 30-, 1100-, and 1200-cm-1 bands, confirming the energy-level scheme and transition assignment of Bosomworth et al. The coupling significantly reduces the level separations of the low-energy anharmonic excitation, and plays an important role in explaining the O18 isotope peak shifts. A physical interpretation is given to the calculated negative coupling constant. The origin of the 517- and 1700-cm-1 bands is also discussed. © 1990 The American Physical Society.
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页码:9650 / 9656
页数:7
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