AN ACCURATE MOS MEASUREMENT PROCEDURE FOR WORK FUNCTION DIFFERENCE IN THE AL/SIO2/SI SYSTEM

被引：5

作者：

KRAUTSCHNEIDER, WH

LASCHINSKI, J

SEIFERT, W

WAGEMANN, HG

机构：

[1] Technische Univ Berlin, Berlin, West Ger, Technische Univ Berlin, Berlin, West Ger

来源：

SOLID-STATE ELECTRONICS | 1986年 / 29卷 / 05期

关键词：

Acknowledgement-This work has been financially supported by the Federal Ministry for Research and Technology (BMF’I’) Bonn (NT 26470);

D O I：

10.1016/0038-1101(86)90080-8

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：571 / 578

页数：8

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