BORON REDISTRIBUTION IN SINTERED ALPHA-SIC DURING THERMAL-OXIDATION

被引：19

作者：

COSTELLO, JA ^{[1
]}

TRESSLER, RE ^{[1
]}

TSONG, IST ^{[1
]}

机构：

[1] PENN STATE UNIV,MAT RES LAB,UNIVERSITY PK,PA 16802

来源：

JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 1981年 / 64卷 / 06期

关键词：

D O I：

10.1111/j.1151-2916.1981.tb10298.x

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：332 / 335

页数：4

共 17 条

[1] MODELS FOR COMPUTER-SIMULATION OF COMPLETE IC FABRICATION PROCESS
ANTONIADIS, DA
DUTTON, RW
[J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (04) : 490 - 500
[2] BORON SEGREGATION AT SI-SIO2 INTERFACE AS A FUNCTION OF TEMPERATURE AND ORIENTATION
COLBY, JW
KATZ, LE
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1976, 123 (03) : 409 - 412
[3] OXIDATION-KINETICS OF HOT-PRESSED AND SINTERED ALPHA-SIC
COSTELLO, JA
TRESSLER, RE
[J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1981, 64 (06) : 327 - 331
[4] KINETICS OF OXIDATION OF HOT-PRESSED SILICON-NITRIDE CONTAINING MAGNESIA
CUBICCIOTTI, D
LAU, KH
[J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1978, 61 (11-1) : 512 - 517
[5] THERMAL OXIDATION OF HEAVILY DOPED SILICON
DEAL, BE
SKLAR, M
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (04) : 430 - +
[6] THEORY AND DIRECT MEASUREMENT OF BORON SEGREGATION IN SIO2 DURING DRY, NEAR DRY, AND WET O2 OXIDATION
FAIR, RB
TSAI, JCC
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (12) : 2050 - 2058
[7] DIFFUSIVITY SUMMARY OF B, GA, P, AS, AND SB IN SIO2
GHEZZO, M
BROWN, DM
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (01) : 146 - 148
[8] REDISTRIBUTION OF ACCEPTOR + DONOR IMPURITIES DURING THERMAL OXIDATION OF SILICON
GROVE, AS
SAH, CT
LEISTIKO, O
[J]. JOURNAL OF APPLIED PHYSICS, 1964, 35 (09) : 2695 - &
[9] ANALYTIC CORRECTION OF EDGE EFFECTS IN ION-BEAM SPUTTERED DEPTH PROFILES
HOFFMAN, DW
TSONG, IST
POWER, GL
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (02): : 613 - 620
[10] IMPURITY REDISTRIBUTION DURING SILICON EPITAXIAL-GROWTH AND SEMICONDUCTOR-DEVICE PROCESSING
LANGER, PH
GOLDSTEIN, JI
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1974, 121 (04) : 563 - 571

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