PHYSICAL AND CHEMICAL NATURE OF FILMS FORMED ON SI(100) SURFACES SUBJECTED TO C2H4 AT ELEVATED-TEMPERATURES

被引：45

作者：

KIM, HJ

DAVIS, RF

COX, XB

LINTON, RW

机构：

[1] N CAROLINA STATE UNIV,DEPT MAT SCI & ENGN,RALEIGH,NC 27695

[2] UNIV N CAROLINA,DEPT CHEM,CHAPEL HILL,NC 27514

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1987年 / 134卷 / 09期

关键词：

D O I：

10.1149/1.2100869

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2269 / 2275

页数：7

共 22 条

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