PHOTOINDUCED CHEMICAL VAPOR-DEPOSITION OF SILICON-OXIDE THIN-FILMS

被引：32

作者：

GONZALEZ, P

FERNANDEZ, D

POU, J

GARCIA, E

SERRA, J

LEON, B

PEREZAMOR, M

机构：

[1] Department of Applied Physics, University of Vigo, 36200 Vigo

来源：

THIN SOLID FILMS | 1992年 / 218卷 / 1-2期

关键词：

D O I：

10.1016/0040-6090(92)90916-Y

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A review of the photo-induced chemical vapour deposition (photo-CVD) processes yielding silicon oxide thin films that have emerged in the last decade is presented. Both lasers and UV lamps as photon sources are included. The basic principles, processing conditions, precursors, geometries, advantages and limitations of the various types of photo-CVD processes are described and compared. Their technological applicability and potential for industrial large-scale installation are discussed.

引用

收藏

页码：170 / 181

页数：12

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