INCORPORATION OF BORON DURING THERMAL CHEMICAL VAPOR-DEPOSITION OF DOPED HYDROGENATED AMORPHOUS-SILICON

被引：4

作者：

BRANZ, HM ^{[1
]}

FLINT, JH ^{[1
]}

HARRIS, CJ ^{[1
]}

HAGGERTY, JS ^{[1
]}

ADLER, D ^{[1
]}

机构：

[1] MIT,CAMBRIDGE,MA 02139

来源：

APPLIED PHYSICS LETTERS | 1987年 / 51卷 / 12期

关键词：

D O I：

10.1063/1.98802

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：922 / 924

页数：3

共 20 条

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[7] DOPED HYDROGENATED AMORPHOUS-SILICON FILMS BY LASER-INDUCED CHEMICAL VAPOR-DEPOSITION [J].

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[9]

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