NEW CRYSTALLINE-STRUCTURE FOR NANOMETER-SIZED GE MICROCRYSTALLITES PREPARED BY PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION

被引：15

作者：

JIANG, JG

CHEN, KJ

HUANG, XF

LI, ZF

FENG, DU

机构：

[1] SOUTHEAST UNIV,CTR MICROELECTR,NANJING 210018,PEOPLES R CHINA

[2] CTR ADV STUDIES SCI & TECHNOL MICROSTRUCT,NANJING 210093,PEOPLES R CHINA

来源：

APPLIED PHYSICS LETTERS | 1994年 / 65卷 / 14期

关键词：

D O I：

10.1063/1.112848

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Crystallized Ge films have been produced in a plasma enhanced chemical vapor deposition system by the decomposition of H-2-diluted GeH4 gas source while using the H-2 plasma treatment. Structural analyses of the films using x-ray diffraction and transmission electron microscopy techniques revealed a new crystalline structure in the Ge microcrystallites with a diameter of about 5 nm, which is different from the normal diamond structure of crystalline Ge. This new nanometer crystalline structure has been explained to be a metastable nanometer-sized atomic configuration formed in the film deposition process. (C) 1994 American Institute of Physics.

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页码：1799 / 1801

页数：3

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