HIGH-PURITY AND CHROME-DOPED GAAS BUFFER LAYERS GROWN BY LIQUID-PHASE EPITAXY FOR MESFET APPLICATION

被引:10
作者
ABROKWAH, JK
HITCHELL, ML
BORELL, JE
SCHULZE, DR
机构
关键词
D O I
10.1007/BF02660130
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:723 / 746
页数:24
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