THERMAL-DEGRADATION OF HOMOEPITAXIAL GAAS INTERFACES

被引:45
作者
LUM, WY
WIEDER, HH
KOSCHEL, WH
BISHOP, SG
MCCOMBE, BD
机构
[1] USN,ELECTR LAB CTR,SAN DIEGO,CA 92152
[2] USN,RES LAB,WASHINGTON,DC 20375
关键词
D O I
10.1063/1.89215
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:1 / 3
页数:3
相关论文
共 13 条
[1]   VAPOR PRESSURES AND PHASE EQUILIBRIA IN GA-AS SYSTEM [J].
ARTHUR, JR .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1967, 28 (11) :2257-&
[2]   INCORPORATION AND CHARACTERIZATION OF ACCEPTORS IN EPITAXIAL GAAS [J].
ASHEN, DJ ;
DEAN, PJ ;
HURLE, DTJ ;
MULLIN, JB ;
WHITE, AM .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1975, 36 (10) :1041-1053
[3]  
BARRERA J, 1975, P IEEE CORNELL C HIG, P135
[4]   INTERPRETATION OF ANOMALOUS LAYERS AT GAAS N+-N- STEP JUNCTIONS [J].
BLOCKER, TG ;
COX, RH ;
HASTY, TE .
SOLID STATE COMMUNICATIONS, 1970, 8 (16) :1313-&
[5]   VARIATION OF MINORITY-CARRIER DIFFUSION LENGTH WITH CARRIER CONCENTRATION IN GAAS LIQUID-PHASE EPITAXIAL LAYERS [J].
CASEY, HC ;
MILLER, BI ;
PINKAS, E .
JOURNAL OF APPLIED PHYSICS, 1973, 44 (03) :1281-1287
[6]   OHMIC CONTACTS TO SOLUTION-GROWN GALLIUM ARSENIDE [J].
HARRIS, JS ;
NANNICHI, Y ;
PEARSON, GL .
JOURNAL OF APPLIED PHYSICS, 1969, 40 (11) :4575-&
[7]   OCCURRENCE OF A HIGH RESISTANCE LAYER IN GAAS SUBSTRATE THROUGH VAPOR EPITAXIAL PROCESS [J].
HASEGAWA, F ;
SAITO, T .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1968, 7 (12) :1540-&
[8]   OCCURENCE OF HIGH RESISTANCE LAYER AT VAPOR EPITAXIAL GAAS FILM-SUBSTRATE INTERFACE [J].
HASEGAWA, F ;
SAITO, T .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1968, 7 (09) :1125-&
[9]   EVIDENCE FOR LUMINESCENCE INVOLVING ARSENIC VACANCY-ACCEPTOR CENTERS IN P-TYPE GAAS [J].
HWANG, CJ .
PHYSICAL REVIEW, 1969, 180 (03) :827-&
[10]   PHOTOLUMINESCENCE FROM DEEP CENTERS IN GAAS [J].
KOSCHEL, WH ;
BISHOP, SG ;
MCCOMBE, BD .
SOLID STATE COMMUNICATIONS, 1976, 19 (06) :521-524